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Bruker Matrix F FT-Near Infrared Spectrometer Bruker Matrix F FT-Near Infrared Spectrometer Bruker Matrix F FT-Near Infrared Spectrometer
Bruker Matrix F FT-Near Infrared Spectrometer
Bruker Matrix F FT-Near Infrared Spectrometer Bruker Matrix F FT-Near Infrared Spectrometer

Bruker Matrix F FT-Near Infrared Spectrometer

Product Details:

  • Accuracy High, spectral resolution up to 8 cm
  • Model No MATRIXX-F
  • Feature Non-destructive measurement, robust industrial design, fast analysis
  • Temperature Range Ambient (typically 10C to 40C)
  • Power Source AC mains
  • Core Components FT-NIR Spectrometer module, control electronics, display unit
  • Frequency 50/60 Hz
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Bruker Matrix F FT-Near Infrared Spectrometer Price And Quantity

Bruker Matrix F FT-Near Infrared Spectrometer Product Specifications

  • Approx. 15 kg
  • High, spectral resolution up to 8 cm
  • MATRIXX-F
  • High-grade metal and industrial plastics
  • Ambient (typically 10C to 40C)
  • Non-destructive measurement, robust industrial design, fast analysis
  • AC mains
  • FT-NIR Spectrometer module, control electronics, display unit
  • Digital, graphical display on control unit
  • Industrial process analysis and quality control
  • 50/60 Hz
  • Approx. 450 mm x 230 mm x 330 mm
  • FT-Near Infrared Spectrometer
  • 400012000 cm (NIR region)
  • Automatic operation, suitable for continuous monitoring
  • 100240 V
  • 10%80% relative humidity, non-condensing
  • Food, Feed, Pharma, Chemical, Automotive
  • Ethernet, USB
  • Factory and user calibration supported
  • IP65 Industrial-grade dust and water protection
  • Multiplexer port for up to 24 measurement positions
  • OPUS Lab and OPUS Process software compatibility
  • 8 cm
  • InGaAs high-sensitivity detector
  • Tungsten halogen lamp (long-life)
  • Customizable for process requirements

Product Description

Brand                         Bruker

Model                         MATRIX-F II

Capacity                    2G Ex px II T6 Gb

CAT No                      MATRIX-F II

Application               Spectroscopy

The MATRIX-F II FT-NIR spectrometer allows direct measurements in process reactors and pipelines, leading to a better understanding and control of the process. Its innovative technology provides consistent high quality results, less downtime and direct method transfer. All Bruker process spectrometers are characterized by robustness, long-term stability, and low maintenance costs.



Highly Customizable for Diverse Industries

The Matrix F FT-NIR Spectrometer adapts to different industrial environments with its customizable system configuration. Whether you are in food production, pharmaceuticals, chemicals, automotive, or feed manufacturing, the instrument offers flexible measurement points and robust build quality to meet your specific process requirements.


Advanced Non-Destructive Analysis

Utilizing a long-life tungsten halogen lamp and an InGaAs high-sensitivity detector, the Matrix F provides rapid, non-destructive measurements in the NIR region (4000-12000 cm1). This allows for the efficient analysis of samples without altering their integrity, ensuring both rapid quality checks and minimal waste.


Seamless Integration and Automation

Equipped with Ethernet and USB communication interfaces, the Matrix F is designed for easy connectivity and integration into existing process control systems. Automation grades and OPUS software compatibility enable streamlined operation, real-time data processing, and minimal manual intervention, supporting continuous monitoring and fast decision-making.

FAQ's of Bruker Matrix F FT-Near Infrared Spectrometer:


Q: How does the Bruker Matrix F FT-NIR Spectrometer perform in harsh industrial environments?

A: The Matrix F is built to operate reliably in challenging industrial settings. It holds an IP65 protection class, meaning it is highly resistant to dust and water ingress, and is constructed with high-grade metals and industrial plastics, ensuring durability for routine operation in demanding environments.

Q: What processes can benefit from continuous monitoring using the Matrix F?

A: Industries such as food processing, pharmaceuticals, chemicals, and automotive production can leverage the Matrix F for continuous monitoring of raw materials, intermediate products, and final outputs. The system's automation and non-destructive nature allow for uninterrupted quality control and process optimization.

Q: When should calibration be performed on the Matrix F spectrometer?

A: Calibration can be done either at the factory or by the user and should be performed whenever there are significant changes in sample types, application requirements, or after any major system maintenance. Regular calibration ensures sustained accuracy and reliability in measurements.

Q: Where can the multiplexer interface be used within a process line?

A: The multiplexer interface of the Matrix F allows connection to up to 24 measurement positions, which can be distributed at key points along a process line. This setup enables comprehensive monitoring across different stages, from input materials to end products.

Q: What are the benefits of using the OPUS Lab and OPUS Process software with this spectrometer?

A: Using OPUS Lab and OPUS Process software allows for advanced method development, data acquisition, process control, and automation. These platforms enable seamless operation, real-time results, secure data management, and integration with other control systems, maximizing productivity.

Q: How is the Matrix F spectrometer powered and operated?

A: The spectrometer operates on AC mains voltage (100-240 V, 50/60 Hz) and features automatic operation, making it suitable for continuous use. The digital, graphical display facilitates intuitive control and status monitoring by operators.

Q: What types of samples and measurements are suitable for the Matrix F FT-NIR spectrometer?

A: The Matrix F is suitable for a range of sample types-solids, powders, liquids-that are encountered in food, feed, pharma, chemical, and automotive industries. Its non-destructive analysis is ideal for ensuring material quality and process consistency within the 4000-12000 cm1 NIR region.

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